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黄东方,倪维元,范红玉,付震琳,黄香露,吴彤,焦海生,牛金海.He+ 辐照剂量对钨纳米丝生长的影响[J].低温物理学报,2020,(6):273-278. [点击复制]
- HUANG Dongfang,NI weiyuan,FAN hongyu,FU zhenlin,HUANG xianglu,WU tong,JIAO haisheng,NIU jinhai.Effect of the He+ Irradiation Dose on W Nano-fuzz Growth[J].LOW TEMPERATURE PHYSICAL LETTERS,2020,(6):273-278. [点击复制]
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| He+ 辐照剂量对钨纳米丝生长的影响 |
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黄东方1, 倪维元2, 范红玉3, 付震琳4, 黄香露5, 吴彤6, 焦海生7, 牛金海8
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| (1.大连民族大学,辽宁省等离子体技术重点实验室,大连,116600;2.大连民族大学,辽宁省等离子体技术重点实验室,大连,116601;3.大连民族大学,辽宁省等离子体技术重点实验室,大连,116602;4.大连民族大学,辽宁省等离子体技术重点实验室,大连,116603;5.大连民族大学,辽宁省等离子体技术重点实验室,大连,116604;6.大连民族大学,辽宁省等离子体技术重点实验室,大连,116605;7.大连民族大学,辽宁省等离子体技术重点实验室,大连,116606;8.大连民族大学,辽宁省等离子体技术重点实验室,大连,116607) |
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| 摘要: |
| 采用低能(50eV)大流强的He+ 辐照多晶钨材料,辐照温度1420±50K,辐照剂量从1.0×1024ions/m2逐渐增加到1.0×1027ions/m2,用扫描电子显微镜、透射电子显微镜、称重等手段分析辐照后钨样品表面微观结构的形貌改变及质量损失的情况,系统的研究了He+ 辐照剂量对钨纳米丝生长的影响.结果表明,随着He+ 辐照剂量的增加,钨纳米丝的厚度最终达到饱和,由于辐照后钨表面存在致密的钨纳米丝层,进而导致到达钨纳米丝层底部的He+ 数量和能量降低,从而导致钨纳米丝生长速率显著降低,且当钨纳米丝生长速率和和钨纳米丝的侵蚀速率相等时,钨纳米丝生长将会达到平衡. |
| 关键词: 金属学,钨纳米丝生长,辐照,侵蚀 |
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| Effect of the He+ Irradiation Dose on W Nano-fuzz Growth |
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HUANG Dongfang1, NI weiyuan2, FAN hongyu3, FU zhenlin4, HUANG xianglu5, WU tong6, JIAO haisheng7, NIU jinhai8
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| (1.Liaoning Key Laboratory of Plasma Technology, Dalian Minzu University, Dalian 116600, China;2.Liaoning Key Laboratory of Plasma Technology, Dalian Minzu University, Dalian 116601, China;3.Liaoning Key Laboratory of Plasma Technology, Dalian Minzu University, Dalian 116602, China;4.Liaoning Key Laboratory of Plasma Technology, Dalian Minzu University, Dalian 116603, China;5.Liaoning Key Laboratory of Plasma Technology, Dalian Minzu University, Dalian 116604, China;6.Liaoning Key Laboratory of Plasma Technology, Dalian Minzu University, Dalian 116605, China;7.Liaoning Key Laboratory of Plasma Technology, Dalian Minzu University, Dalian 116606, China;8.Liaoning Key Laboratory of Plasma Technology, Dalian Minzu University, Dalian 116607, China) |
| Abstract: |
| Polycrystalline tungsten materials were irradiated by 50 eV He+. The irradiation temperature was 1420 土50 K and the irradiation dose gradually increased from 1.0×1024 ions/m2 to 1.0×1027 ions/m2. Scanning electron microscope, transmission electron microscope, and weighing were used to analyze the changes of the W surface and the mass loss of W before and after irradiation. The effect of the irradiation dose on the growth of W Nano-fuzz growth was systematically studied. As a result, with the increase of the irradiation dose, the thickness of W Nano-fuzz growth finally reaches saturation. Due to the existence of dense W Nano-fuzz growth layer on the tungsten surface after irradiation, the amount and energy of the He ions reaching the bottom of W Nano-fuzz growth layer are reduced, which leads to a significant decrease in the growth rate of W Nano-fuzz growth. Finally, when the growth rate of W Nano-fuzz growth and the erosion rate of tungsten fuzz are equal, the thickness of W Nano-fuzz growth will reach a constant. |
| Key words: metallography, W Nano-fuzz growth, irradiation, erosion |
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